Super Purchasing for Metal Diaphragm For Pressure Sensor - Metal rotary target – WINNERS

Product Description

Metal Rotary Target

Orthogonal magnetic and electric fields are applied between the sputtering target (cathode) and the anode. And fill the required inert gas (usually Ar gas) in the high vacuum chamber. Under the action of an electric field, Ar gas is ionized into positive ions and electrons. A certain negative high voltage is applied to the target, the electrons emitted by the target are affected by the magnetic field, the ionization probability of the working gas increases, a high-density plasma is formed near the cathode, and the Ar ions are affected by the Lorentz force. Then accelerate to fly to the target surface, and bombard the target surface at high speed, so that the sputtered atoms on the target follow the principle of momentum conversion, fly from the target surface to the substrate, and deposit a high kinetic energy film.

In order to further improve the utilization rate of the target material, a rotating cathode with higher use efficiency is designed, and a tubular target material is used for sputtering coating. The improvement of sputtering equipment requires the target to be changed from a flat shape to a tubular shape, and the utilization rate of the tubular rotating target can be as high as 70%, which largely solves the problem of low utilization of the flat target.

Note: We mainly produce various metal targets, please consult us for details.

Application

Sputtering coating is a new type of physical vapor coating method. Compared with the evaporation coating method, it has obvious advantages.​
in many aspects. Metal sputtering targets have been used in many fields. The main application of rotating target.
■ Solar cells
■ Architectural glass
■ Auto glass
■ Semiconductor
■ Flat-screen TV, etc

Order Information

Inquiries and orders should include the following information:​
☑ Target specification ID×OD×L (mm).
☑ Quantity required.
☑ Please contact us for more special needs.