Special Design for Metal Membrane Supplier - Pure Planar titanium target – WINNERS

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Special Design for Metal Membrane Supplier - Pure Planar titanium target – WINNERS Detail:

Product Description

Sputtering is one of the main techniques for preparing thin film materials. It uses ions generated by ion sources to accelerate and aggregate in a vacuum to form high-speed energy ion beams, bombard the solid surface, and exchange kinetic energy between ions and solid surface atoms. The atoms on the solid surface leave the solid and are deposited on the surface of the substrate. The bombarded solid is the raw material for preparing the thin film deposited by the sputtering method, which is called the sputtering target.

Product Parameters

Products name	Planar target material
Shape	Square target, Round Target
Hot sale size	Rod target Φ10040mm, Φ9540mm，Φ9845mm，Φ8035mm
Hot sale size	Square target 3mm, 5mm, 8mm, 12mm
MOQ	3 pieces
Material	Ti, Cr, Zr, W, Mo, Ta,Ni
Production Process	Molten casting method, powder metallurgy method

Note: We can produce and process various metal targets, and can customize various specifications. Please consult us for details.

Application

Magnetron sputtering coating is a new type of physical vapor coating method. Compared with evaporation coating method, it has obvious advantages in many aspects. Metal sputtering targets have been used in many fields.The main application of flat target.
● Decoration industry
● Architectural glass
● Auto glass
● Low-E glass
● Flat panel display
● Optical industry
● Optical data storage industry, etc

Order Information

Inquiries and orders should include the following information
● Target material.
● The shape of the target material, according to the shape, provide specifications or provide samples and drawings.
● Please provide thread specifications for targets that need threaded connection, such as: M90*2 (thread major diameter * thread pitch).
Please contact us for other special needs.

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